Title:
Deep ultraviolet chemicals amplification type positive type photoresist
Document Type and Number:
Japanese Patent JP6169478
Kind Code:
B2
Abstract:
The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency.
Inventors:
Liu Lou
Che-Chiang
Hui Guan Pao
Che-Chiang
Hui Guan Pao
Application Number:
JP2013227035A
Publication Date:
July 26, 2017
Filing Date:
October 31, 2013
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO.,LTD.
International Classes:
G03F7/039; C07C61/29; C08F232/08; G03F7/004
Domestic Patent References:
| JP2000298344A | ||||
| JP11258804A | ||||
| JP2001261620A |
Foreign References:
| WO2005052688A1 | ||||
| EP2728408B1 | ||||
| US9023590 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Atsushi Ebiya
Yoshihiro Kobayashi
Kazuo Yoshii
Takashi Ishida
Tetsuji Koga
Atsushi Ebiya
Yoshihiro Kobayashi
Kazuo Yoshii