To provide a pattern substrate defect correction method and device to reliably correct a defect, and to provide a pattern substrate manufacturing method.

The defect correction device includes a transfer film 18 which has a transfer layer transferred to a pixel boundary part and is oppositely arranged on a substrate 6, and an application needle 27 which corrects the pixel contacting the pixel boundary part of which transfer layer is transferred from the transfer film 18 by a correction fluid 29 corresponding to the pixel.