DEFECT DETECTING METHOD, DEFECT OBSERVING METHOD AND DEFECT DETECTING APPARATUS

Title:

DEFECT DETECTING METHOD, DEFECT OBSERVING METHOD AND DEFECT DETECTING APPARATUS

Document Type and Number:

Japanese Patent JP2002100660

Kind Code:

A

Abstract:

To provide a highly sensitive inspection technology that can prevent detection of misinformation.

This defect detecting method has a means to detect an image of a whole chip, and, an inspection region of this image is divided into a plurality of regions based on sensitivity to fatal defects so that inspection sensitivity can be set up in each region. Or by recording a characteristic amount to judge a defect in an inspection result, for example a shading difference, misinformation can be removed in a post handling after the inspection. Moreover, by configuring a sharing system of inspecting conditions and others necessary in common among a group of inspection apparatuses, it becomes possible to reduce the time finding out an inspecting condition and monitor stability and reliability.

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