Title:
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
Document Type and Number:
Japanese Patent JP2023142884
Kind Code:
A
Abstract:
To provide a defect inspection device with which it is possible to automatically detect an optimum optical condition for capturing an image of a region that includes a defect by a simple method.SOLUTION: A defect inspection device 1 comprises an optical microscope 10 that is provided with an image-capturing unit 14 that captures an image of a chip 31, a control unit 20 that controls an optical condition for capturing the image of a chip, and a storage unit 25 in which the preliminarily detected positions of defects in the chip are stored. The image-capturing unit includes detection means that captures a first image of a region that includes the defect stored in the storage unit while changing the optical condition, and captures a second image of a region in the same region as the region that includes the defect, that does not include a defect, and compares the feature quantity of the first image with the feature quantity of the second image, thereby detecting an optimum optical condition for capturing an image of the region that includes a defect.SELECTED DRAWING: Figure 1
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Inventors:
KUZE YASUYUKI
Application Number:
JP2022050008A
Publication Date:
October 06, 2023
Filing Date:
March 25, 2022
Export Citation:
Assignee:
TORAY ENG CO LTD
TASMIT INC
TASMIT INC
International Classes:
G01N21/956
Attorney, Agent or Firm:
Patent Attorney Corporation Maeda Patent Office