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Title:
DEGASSING PROCESS FOR DISSOLVED GAS IN LIQUID
Document Type and Number:
Japanese Patent JPH02139007
Kind Code:
A
Abstract:

PURPOSE: To degas dissolved gas efficiently by bringing dissolved gas containing liquid into contact with a selectively permeable double layer membrane composed of a synthetic non-porous active film formed on a porous substrate membrane.

CONSTITUTION: An organic solvent solution of synthetic resin such as silicone- polymer, polypropylene or the like is brought into contact with the surface of a porous substrate membrane of aromatic polysulfone or the like, and a solvent is evaporated, volatilized and then dried to form a selectively permeable double layer membrane with a synthetic non-porous active film on the surface of the porous substrate membrane. Dissolved gas is degassed efficiently with high degassing speed and at low cost by treating liquid containing dissolved gas by means of said selectively permeable double layer membrane.


Inventors:
TOZAWA OSAMI
SASAKI TAKESHI
SHIMAZU AKIRA
IWAMA AKIO
Application Number:
JP26500088A
Publication Date:
May 29, 1990
Filing Date:
October 19, 1988
Export Citation:
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Assignee:
NITTO DENKO CORP
International Classes:
B01D19/00; (IPC1-7): B01D19/00
Domestic Patent References:
JPH022802A1990-01-08



 
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