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Title:
DENATURATION TREATMENT METHOD FOR SUBSTANCE
Document Type and Number:
Japanese Patent JP2011183377
Kind Code:
A
Abstract:

To enable denaturation treatment of an economically more advanced substance with small consumption of magnetic energy by improving efficiency of the denaturation (modification) treatment of a substance using magnetism.

A substance to be treated is disposed on one side of the layer of copper, or a copper alloy or metal silicon and also a magnetic line of force or a low frequency magnetic wave is incident from another side of the layer of the copper, or the copper alloy or the metal silicon to irradiate the substance to be treated with the magnetic line of force or the low frequency magnetic wave transmitting the layer of the copper, or the copper alloy or the metal silicon, thereby denaturalizing the physical properties of the substance to be treated.


Inventors:
NIINO KIYONORI
Application Number:
JP2011018056A
Publication Date:
September 22, 2011
Filing Date:
January 31, 2011
Export Citation:
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Assignee:
NIHON TECHNICAL DEV CT CO LTD
International Classes:
B01J19/08; A23L3/26; C02F1/48; C10G32/02
Domestic Patent References:
JP2004108758A2004-04-08
JP2008018099A2008-01-31
JPH06294576A1994-10-21
JP2006158700A2006-06-22
JP2002361262A2002-12-17
Attorney, Agent or Firm:
Takeshi Sugimoto