Title:
低い重合収縮率を有する歯科材料
Document Type and Number:
Japanese Patent JP5383012
Kind Code:
B2
Abstract:
Dental materials (I) comprises at least one polymerizable calix[n]arene (II) (0.5-90 wt.%), initiator (0.01-5 wt.%), additional monomer (0-90 wt.%), which can polymerize under cationic and/or radical conditions and/or by ring opening, filler (0-85 wt.%), additive (0.01-5 wt.%) and solvent (0-70 wt.%). Dental materials (I) comprises at least one polymerizable calix[n]arene of formula (II) (0.5-90 wt.%), initiator (0.01-5 wt.%), additional monomer (0-90 wt.%), which can polymerize under cationic and/or radical conditions and/or by ring opening, filler (0-85 wt.%), additive (0.01-5 wt.%) and solvent (0-70 wt.%). n : 1-5 (preferably 1-3); R 1>-R 4>H, 1-15C (preferably 1-10C) alkyl radical which can be interrupted by O, phenyl radical or benzyl radical (preferred); X 1>Y 1>-Ra1(Ya1-Rb1-V 1>-PG 1>) m, in which Y 1> = not present or O, ester (all preferred), amide or urethane; Ra1 : m-valent organic radical comprising 1-30C (preferably 1-15C) and, if appropriate, also from 0-6 heteroatoms of O (preferably 0-3), S or N; m : 1-3 (preferably 1-2); Ya1 : not present, O, ester (all preferred), amide or urethane; Rb1 : not present or 1-16C alkylene radical which can be interrupted by oxygen atoms; PG 1>polymerizable group (e.g. a group which can polymerize under radical conditions, such as (meth-)acrylate, (meth)acrylamide, vinyl, allyl or styryl), cyclic group which can polymerize under radical conditions by ring opening (e.g. the thiocane moiety of formula (a), cyclopropane moiety of formula (b) or bicyclo compound of formula (c) or a group which can polymerize under cationic conditions, such as, e.g. a vinyl ether or glycidyl, a cycloaliphatic epoxide or oxetane or a polymerizable nitrone group (preferably polyreactive nitrone group), with Yb1 = not present or O, ester, urethane (all preferred) or amide); Rc1, Rd1 : 1-15C (preferably 1-5C) alkyl radical which can be interrupted by O, phenyl radical or benzyl radical; X 2>-X 4>not present, OH, 1-10C alkyl radical in addition which can represent a amide moiety of formula (Ya2-Rb2-AG) p; Ya2 : not present, O, ester (all preferred), amide or urethane; Rb2 : p-valent organic radical which can comprise 1-20C (preferably 1-10C) and, if appropriate, also from 0-4 heteroatoms of O (preferably 0-2 of O atoms) or N; p : 1-3 (preferably 1-2); and AG : anchoring group such as -P=O(OH) 2, -O-P=O(OH) 2, -COOH or -O-SO 2OH. [Image] [Image].
Inventors:
Norbert Mosner
Helmut Ritter
Urs-Karl Fisher
Moneil Tabatabai
Matthias Shoup
Andreas Wooter Otto
Helmut Ritter
Urs-Karl Fisher
Moneil Tabatabai
Matthias Shoup
Andreas Wooter Otto
Application Number:
JP2007222584A
Publication Date:
January 08, 2014
Filing Date:
August 29, 2007
Export Citation:
Assignee:
Ivoclar Vivadent AG
Heraeus Kulzer GmbH
Heraeus Kulzer GmbH
International Classes:
A61K6/00; A61K6/884; C08F2/44; C08F20/30; C08G8/30
Domestic Patent References:
| JP9263560A | ||||
| JP2000072869A |
Foreign References:
| US20060257281 | ||||
| US4699966 | ||||
| US4933407 | ||||
| US20040091632 | ||||
| US5077360 |
Attorney, Agent or Firm:
Toshio Yano
Takuya Kuno
Kimihiro Hoshi
Hiroyasu Ninomiya
Einzel Felix-Reinhard
Takuya Kuno
Kimihiro Hoshi
Hiroyasu Ninomiya
Einzel Felix-Reinhard