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Title:
DEPOSITION APPARATUS AND DEPOSITION METHOD
Document Type and Number:
Japanese Patent JP2010121215
Kind Code:
A
Abstract:

To solve such a problem that when co-deposition is performed heretofore, since heaters surrounding containers for storing deposition materials are inclined, the space between the containers is increased and it becomes difficult to uniformly mix the deposition materials, so that the co-deposition is performed while reducing the space between the containers and uniformly mixing the deposition materials.

The openings of the containers are adjusted so that the evaporation centers of the deposition materials may hit one point of a material to be deposited. In the co-deposition shown in Fig.(D), both an opening 810a and an opening 810b are opposed. Alternatively, in the co-deposition shown in Fig.(E), the evaporation is performed using one upper part having an opening 810c for perpendicularly evaporating a deposition material and the other upper part having an opening 810d inclined in the direction of the one upper part.


Inventors:
YAMAZAKI SHUNPEI
SAKATA JUNICHIRO
KUWABARA HIDEAKI
Application Number:
JP2010005752A
Publication Date:
June 03, 2010
Filing Date:
January 14, 2010
Export Citation:
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Assignee:
SEMICONDUCTOR ENERGY LAB
International Classes:
C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
JPH10242054A1998-09-11
JPS58207369A1983-12-02
JPS57100998A1982-06-23
JPS60161394A1985-08-23
JPS63277752A1988-11-15
JPS57131362A1982-08-14
JPS6015698B21985-04-20
JPS51122158U1976-10-04
JPH0290662U1990-07-18
JPH0297663A1990-04-10
JPS54150332A1979-11-26