Title:
DEPOSITION DEVICE
Document Type and Number:
Japanese Patent JP2015142038
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technique for enhancing the film quality, while enhancing the deposition speed for a substrate.SOLUTION: A deposition device is constituted to include a turntable arranged in a vacuum vessel and revolving a substrate mounted in a mounting region provided on one side thereof, a process gas supply section for supplying process gas, having a thermal decomposition temperature of 520°C or more under 1 atm, to the substrate, and a heating section for heating the turntable so as to perform deposition by heating the substrate to 600°C or more. The process gas supply section includes a gas shower head having a plurality of process gas discharge holes provided to face the passage region of the substrate, and a cooling mechanism for cooling a portion of the gas shower head facing the passage region down to a temperature lower than the thermal decomposition temperature of the process gas.
Inventors:
ONO YUJI
TACHIBANA MITSUHIRO
HONMA MANABU
TACHIBANA MITSUHIRO
HONMA MANABU
Application Number:
JP2014014575A
Publication Date:
August 03, 2015
Filing Date:
January 29, 2014
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/31; H01L21/316
Domestic Patent References:
| JP2013172153A | 2013-09-02 | |||
| JP2012023221A | 2012-02-02 | |||
| JP2004288903A | 2004-10-14 | |||
| JP2012079919A | 2012-04-19 | |||
| JP2009512188A | 2009-03-19 | |||
| JP2012525708A | 2012-10-22 | |||
| JP2011222960A | 2011-11-04 | |||
| JP2013172153A | 2013-09-02 | |||
| JP2012023221A | 2012-02-02 | |||
| JP2004288903A | 2004-10-14 |
Attorney, Agent or Firm:
Toshio Inoue
Tomoaki Miida
Tomoaki Miida