Title:
DERIVATIZED POLYHYDROXYSTYRENE HAVING NOVOLAC TYPE STRUCTURE
Document Type and Number:
Japanese Patent JP2010106278
Kind Code:
A
Abstract:
To provide a novel method of manufacturing a 4-hydroxystyrene polymer useful for a photoresist or the like without using a raw material, 4-hydroxystyrene, having a problem of easy decomposition or the like.
The novel derivatized poly(4-hydroxystyrene) (PHS) is obtained by methyl-etherizing 4-hydroxymethyl-carbinol in stead of 4-hydroxystyrene and polymerizing the methyl-etherized compound. The NMR measurement shows that the obtained PHS is substantially linear (about 6 to about 40 wt.%) in comparison with the conventional PHS and further has low polydispersity (less than about 2.0).
Inventors:
SHEEHAN MICHAEL T
ZEY EDWARD G
ZEY EDWARD G
Application Number:
JP2009277598A
Publication Date:
May 13, 2010
Filing Date:
December 07, 2009
Export Citation:
Assignee:
DUPONT ELECTRONIC POLYMERS LP
International Classes:
C08G61/02; C08G61/04; C09D125/18; G03C1/76; G03F7/023; G03F7/038
Domestic Patent References:
| JPS5653131A | 1981-05-12 | |||
| JPS6166709A | 1986-04-05 | |||
| JP2000502371A | 2000-02-29 | |||
| JP2002525304A | 2002-08-13 | |||
| JP2001500917A | 2001-01-23 | |||
| JP2001515526A | 2001-09-18 | |||
| JPS5653131A | 1981-05-12 | |||
| JPS6166709A | 1986-04-05 | |||
| JP2000502371A | 2000-02-29 | |||
| JP2002525304A | 2002-08-13 |
Attorney, Agent or Firm:
Shinjiro Ono
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Hiroaki Noya
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Hiroaki Noya
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