Title:
【発明の名称】マイクロエレクトロニクス用ウエハの化学処理装置及び方法
Document Type and Number:
Japanese Patent JP2002507056
Kind Code:
A
Abstract:
The invention relates to an installation for treating wafers made of materials serving as microelectronics substrates including a tank for containing a treatment bath, a wafer support device capable of receiving at least one wafer of a first size, and an element for grasping and placing each wafer of the first size in the bath and for removing it therefrom. The installation further includes a support for receiving at least one wafer of a second size that is smaller than the first size, the shape of the support allowing it to be grasped by the grasping element and received by the wafer support device in the tank.
Inventors:
Rameur, Jean Michel
Application Number:
JP2000536096A
Publication Date:
March 05, 2002
Filing Date:
March 09, 1999
Export Citation:
Assignee:
S-Tech Silicon On Insulator Technologies
International Classes:
H01L21/677; B65G49/07; H01L21/00; H01L21/304; H01L21/306; H01L21/673; (IPC1-7): H01L21/304; H01L21/306; H01L21/68
Attorney, Agent or Firm:
Masatoshi Sato (1 person outside)