Title:
【発明の名称】低蒸気圧液体供給源からCVD室まで前駆体蒸気を運搬する装置及び方法
Document Type and Number:
Japanese Patent JP2003514992
Kind Code:
A
Abstract:
A CVD reactor is provided with a precursor delivery system that is integrally connected to the reactor chamber. Liquid precursor such as a copper or other metal-organic precursor is atomized at the entry of a high flow-conductance vaporizer, preferably with the assistance of an inert sweep gas. Liquid precursor is maintained, when in an unstable liquid state, at or below room temperature. In the vaporizer, heat is introduced to uniformly heat the atomized precursor. The vaporized precursor is passed into a diffuser which diffuses the vapor, either directly or through a showerhead, into the reaction chamber.
Inventors:
Hillman, Joseph, Tee
Yasar, Taglar
Kenichi Kubo
Vezan, Vincent
Mountain Saki Eisuke
Yasuhiko Kojima
Yumiko Kono
Hideki Yoshikawa
Yasar, Taglar
Kenichi Kubo
Vezan, Vincent
Mountain Saki Eisuke
Yasuhiko Kojima
Yumiko Kono
Hideki Yoshikawa
Application Number:
JP2001538581A
Publication Date:
April 22, 2003
Filing Date:
September 15, 2000
Export Citation:
Assignee:
東京エレクトロン株式会社
トーキョー エレクトロン アリゾナ インコーポレイテッド
トーキョー エレクトロン アリゾナ インコーポレイテッド
International Classes:
C23C16/455; C23C16/448; (IPC1-7): C23C16/455
Domestic Patent References:
| JPH10135197A | 1998-05-22 | |||
| JPH10280149A | 1998-10-20 | |||
| JPH06181177A | 1994-06-28 |
Foreign References:
| US5835678A | 1998-11-10 |
Attorney, Agent or Firm:
Akira Asamura (3 outside)