To provide an advantageous technique for design of an exposure device which can reduce variation of aberration of a projection optical system caused by temperature variation.
A method of designing a projection optical system having a hold mechanism for an optical element and an adjusting mechanism for adjusting aberration by using a computer comprises a first step for determining a first variation corresponding to aberration of the projection optical system caused by variation of at least one of the refractive index, thickness and surface shape of the optical element which follows temperature variation of the environment of the projection optical system from reference temperature, a second step for determining a second function representing a second variation corresponding to the variation of the aberration of the projection optical system by using a first function containing the linear expansion coefficient and thickness of a holding member as variables, a third step for determining a third function representing a third variation corresponding to the variation of the aberration of the projection optical system caused by an operation of the adjusting mechanism, and a fourth step for determining the linear expansion coefficient and thickness of the holding member and the operation amount of the adjusting mechanism so as to reduce the sum of the first variation, the second variation and the third variation.
| JP2679940 | POSITIONING DEVICE |
| JP3880480 | LIQUID TREATMENT DEVICE |
| WO/2005/010963 | ILLUMINATING OPTICAL SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD |
TADOKORO KAZUHIRO
MOIZUMI JUN
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu