Title:
DESIGNING METHOD OF APPROXIMATION LIGHT SOURCE
Document Type and Number:
Japanese Patent JP2015115423
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a designing method of an exposure light source which is capable of generating a mask image as sharp as a light source of pixelated light intensity distribution and can be easily manufactured.SOLUTION: The designing method includes: a first step of deriving first light intensity distribution of exposure light where the first light intensity distribution on a light-emitting plane is pixelated, averaged or smoothed for at least each first pixel group in such a manner that a first deviation degree does not exceed a first allowable value, the first deviation degree being obtained by quantizing a difference between second light intensity distribution of a first mask image obtained by irradiating an exposure plane via a photo mask with the exposure light and target light intensity distribution of the second light intensity distribution; and a second step of binarizing the first light intensity distribution that is derived in the first step.
Inventors:
NITANI HIROTAKA
Application Number:
JP2013255578A
Publication Date:
June 22, 2015
Filing Date:
December 11, 2013
Export Citation:
Assignee:
FUJITSU SEMICONDUCTOR LTD
International Classes:
H01L21/027; G02B19/00
Domestic Patent References:
| JP2010020187A | 2010-01-28 | |||
| JP2011238706A | 2011-11-24 | |||
| JP2011151423A | 2011-08-04 | |||
| JPH06120119A | 1994-04-28 | |||
| JP2011238706A | 2011-11-24 | |||
| JP2010020187A | 2010-01-28 | |||
| JP2012151246A | 2012-08-09 | |||
| JP2011187597A | 2011-09-22 | |||
| JP2002334836A | 2002-11-22 | |||
| JP2001110706A | 2001-04-20 | |||
| JP2008166777A | 2008-07-17 |
Foreign References:
| WO2011102109A1 | 2011-08-25 | |||
| US20060050261A1 | 2006-03-09 |
Attorney, Agent or Firm:
Kenji Doi
Hayashi Tsunetoku
Hayashi Tsunetoku