Title:
DETECTION OF ETCHING TERMINATION
Document Type and Number:
Japanese Patent JPS6022322
Kind Code:
A
Abstract:
PURPOSE:To easily detect termination of etching by detecting the variation of pressure of an etching gas. CONSTITUTION:An etching specimen 15 is placed on a lower electrode 7 and after air is extracted to a vacuum, an N2 gas is supplied and the pressure is maintained at a specific value by adjusting a valve 8. Then, the etching is carried out being applied with a power from an RF power source 6. The pressure in an etching chamber 14 starts to be reduced in approx. 30sec after the etching is started and starts to be increased when termination of the etching is close-by. Consequently, the termination point of etching can be detected by detecting the increase of the pressure.
Inventors:
ARIKADO TSUNETOSHI
Application Number:
JP13021483A
Publication Date:
February 04, 1985
Filing Date:
July 19, 1983
Export Citation:
Assignee:
TOSHIBA KK
International Classes:
H01L21/302; H01L21/3065; (IPC1-7): H01L21/302
Attorney, Agent or Firm:
Noriyuki Noriyuki
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