DETERGENT COMPOSITION CONTAINING NUCLEOPHILIC AMINE COMPOUND HAVING REDUCTION AND OXIDATION POTENTIALS AND METHOD FOR WASHING SUBSTRATE USING THE SAME

Japanese Patent JP3048207

B2

PURPOSE: To obtain a resist and etching residue removing compsn. consisting of at least one kind of nucleophilic amine compd. having oxidation and reduction potentials, at least one kind of solvent miscible with the amine compd., water and one or more kinds of optional chelating agents and to wash a microcircuit board by removing a resist with the compsn.
CONSTITUTION: This detergent compsn. for removing a resist and etching residue from a substrate contains at least one kind of nucleophilic amine compd. having oxidation and reduction potentials, at least one kind of org. solvent, water and an optional chelating agent. The amine compd. and org. solvent exist by amts. enough to remove the resist and etching residue. The chelating agent is preferably contained so as to impart effect over a long period of time to this compsn. by ensuring stability and activity.

Yi Moon Lee
Charles You Pitman Junior
Robert Juie Small

JP19394093A

June 05, 2000

July 09, 1993

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E.K.C.Technology Inc.

C11D7/60; B24B37/04; C09D9/00; C11D3/20; C11D3/30; C11D3/34; C11D3/43; C11D7/26; C11D7/32; C11D7/34; C11D7/50; C11D11/00; C23G1/10; C23G1/20; G03F7/32; G03F7/42; H01L21/02; H01L21/027; H01L21/30; H01L21/304; H01L21/308; H01L21/311; H01L21/321; H01L21/3213; H01L21/768; H01L21/306; (IPC1-7): G03F7/42; C11D7/60; H01L21/027; H01L21/304; H01L21/308

JP4289866A
JP63241545A
JP642325A
JP49111975A
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JP6424254A
JP6295531A
JP63183445A
JP6249355A
JP1105949A
JP6421088A
JP565899A
JP1159388A
JP5259066A

【文献】欧州特許出願公開485161(EP,A1)

Eiji Katayama (1 person outside)

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