Title:
重水素化方法
Document Type and Number:
Japanese Patent JP4396522
Kind Code:
B2
Abstract:
The present invention relates to a method for deuteration of a compound represented by the general formula [1]: R1-X-R2 [1] wherein, R1 represents an alkyl group or an aralkyl group, which may have a carbon-carbon double bond and/or triple bond; R2 represents an alkyl group which may have a carbon-carbon double bond and/or triple bond, an aryl group, an aralkyl group, an alkoxy group, an aryloxy group or a hydroxyl group; X represents a carbonyl group or a hydroxylmethylene group, R1 and R2 may form an alicyclic ring together with a carbon atom contained in X; provided that R2 represents an alkyl group which may have a carbon-carbon double bond and/or triple bond, an aryl group or an aralkyl group when X is a hydroxylmethylene group, comprising reacting the compound represented by the general formula [1] with a heavy hydrogen source in the co-presence of an activated catalyst selected from a palladium catalyst, a platinum catalyst, a rhodium catalyst, a ruthenium catalyst, a nickel catalyst and a cobalt catalyst. The method of the present invention can significantly improve working environment because the deuteration, which has been conventionally carried out under severe conditions such as basic condition, can be carried out under neutral condition. Further, even when the compound represented by the general formula [1] is one having a carbon-carbon double bond or triple bond, the method for deuteration of the present invention enables to efficiently carry out objective deuteration without reduction of said double bond or triple bond.
Inventors:
Nobuhiro Ito
Maezawa Noriaki
Kazushige Muto
Hirota Kozo
Hironao Sajiki
Maezawa Noriaki
Kazushige Muto
Hirota Kozo
Hironao Sajiki
Application Number:
JP2004564469A
Publication Date:
January 13, 2010
Filing Date:
November 07, 2003
Export Citation:
Assignee:
Wako Pure Chemical Industries, Ltd.
International Classes:
C07B59/00; C07C29/00; C07C31/02; C07C35/08; C07C35/29; C07C35/37; C07C45/00; C07C49/04; C07C49/08; C07C49/433; C07C49/453; C07C51/00; C07C53/10; C07C53/124; C07C57/04; C07B61/00
Domestic Patent References:
| JP45017402B1 | ||||
| JP63198638A | ||||
| JP61275241A | ||||
| JP61277648A |