PURPOSE: To obtain a developer capable of forming a stain-free clear image and suitable for a photosensitive resin composition based on a cyclized butadiene type polymer by using a fluorine-containing compound.
CONSTITUTION: A fluorine-containing compound such as tetrachlorodifluoroethane, trichlorotrifluoroethane or dibromotetrafluoroethane optionally mixed with other solvent is used as a developer for a photosensitive resin composition prepared by blending cyclized polybutadiene as a principal component with a photocrosslinking agent, a photosensitizer, a shelf stabilizer, etc. The compound is represented by the general formula [Where X is halogen other than fluorine; a is 0W3; and b is 0W 3 (yet both a and b are not 3)]. The solvent used includes dichloromethane, ethanol and acetone, and the amt. of the fluorine-containing compound contained in the developer is preferably about 40W100wt%.
TASHIRO MITSURU
HARADA TOKOU
