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Title:
DEVELOPMENT PROCESSOR AND METHOD FOR CONTROLLING TEMPERATURE OF DEVELOPMENT PROCESSING LIQUID
Document Type and Number:
Japanese Patent JP2006133390
Kind Code:
A
Abstract:

To improve the state where ON-OFF frequency in a heater for temperature control to a development processing liquid is made incessant, and to improve the service life of the heater.

In the temperature control method for a development processing liquid in a development processor device provided with: a heater for heating a development processing liquid stored in a processing tank for development processing; and a cooling fan for cooling the development processing liquid, the atmospheric temperature in the device body is detected by a first temperature sensor, further, the atmospheric temperature in the outside of the device body is detected by a second temperature sensor, and, if the difference in the atmospheric temperatures between the inside and the outside is a prescribed value or higher, the cooling fan is operated in a state its revolving speed is reduced.


Inventors:
NAKANO TSUKASA
Application Number:
JP2004320780A
Publication Date:
May 25, 2006
Filing Date:
November 04, 2004
Export Citation:
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Assignee:
NORITSU KOKI CO LTD
International Classes:
G03D3/00
Domestic Patent References:
JP2000250381A2000-09-14
JPH047898A1992-01-13
JP2003076251A2003-03-14
JPH11143151A1999-05-28
JPH0736167A1995-02-07
JP2000122254A2000-04-28
JP2004117732A2004-04-15
Attorney, Agent or Firm:
Noboru Fujimoto
Seiichi Yakumaru
Hiroaki Nakatani
Tokuya Iwata