Title:
Device Correlation Metrics (DCM) for OVL with Embedded SEM Structure Overlay Targets
Document Type and Number:
Japanese Patent JP6320387
Kind Code:
B2
Abstract:
Aspects of the present disclosure describe a target for use in measuring a relative position between two substantially coplanar layers of a device. The target includes periodic structures in first and second layers. Differences in relative position of the first and the second layers between the first and second periodic structures and the respective device-like structure can be measured to correct the relative position of the first and the second layers between the first and second periodic structures. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Inventors:
Amir Nouriel
Choi Don Sub
Itazkovic Tal
Candel daniel
Choi Don Sub
Itazkovic Tal
Candel daniel
Application Number:
JP2015531199A
Publication Date:
May 09, 2018
Filing Date:
September 05, 2013
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
G03F9/00; G01B11/00; G01B15/00
Domestic Patent References:
| JP2004279405A | ||||
| JP2008218516A | ||||
| JP2112223A | ||||
| JP2009200466A |
Foreign References:
| WO2003071471A1 | ||||
| US20030223630 | ||||
| WO2005079498A2 | ||||
| WO2007040855A1 | ||||
| US20070076205 | ||||
| WO2006007297A1 | ||||
| US20050286052 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office