To make stable dynamic characteristic judgment, and to make it difficult to generate time delay by outputting the adaptability of a dynamic characteristic model from the difference of each state estimating part and the covariance.
A common observed value is inputted to a state estimating part 101 whose follow-up ability is unsatisfactory and a state estimating part 102 whose follow-up ability is satisfactory, and the state of this system is estimated. Each state estimating part 101 and 102 outputs a state estimated value and a state estimated value error covariance. An estimated value analyzing part 103 calculates the difference of each state estimating part output, and calculates the covariance of the difference. Then, the estimated value analyzing part 103 outputs the adaptability of a dynamic characteristic model from the difference of each state estimating part output and the covariance. When the supposed dynamic characteristic model is correct, the two estimated results have large correlation and a difference is hardly generated since the common observed value is inputted. On the other hand, when the dynamic characteristic model is incorrect, a difference is generated between the two estimated results due to the difference of the follow-up ability. Therefore, the adaptability of the dynamic characteristic model can be judged by evaluating the balance of the correlation and the difference.
WO/2020/172851 | METHOD AND APPARATUS FOR UPDATING DATA OF INDUSTRIAL MODEL |
JPH0754262 | [Title of Invention] Model simulation device |
JPH08247522 | HEAT LOAD FORECAST DEVICE |
IWAMURA YASUSHI
MAEDA AKIRA
TAKAHASHI SHINICHI
FUJINO NOBUHIRO
HINO KAZUHIKO
JPH07218611A | 1995-08-18 | |||
JPH03242577A | 1991-10-29 | |||
JPH06297017A | 1994-10-25 | |||
JPH05232217A | 1993-09-07 | |||
JPH05265513A | 1993-10-15 | |||
JPH0643241A | 1994-02-18 | |||
JPH06187030A | 1994-07-08 | |||
JPH0713611A | 1995-01-17 | |||
JPH07191703A | 1995-07-28 | |||
JPH0266481A | 1990-03-06 | |||
JPH08179029A | 1996-07-12 |
Next Patent: METHOD FOR CONTROLLING TEMPERATURE OF HEAT TREAT FURNACE FOR MANUFACTURING SEMICONDUCTOR