PURPOSE: To uniformly and stably form a high-quality built-up film at high speed at a low cost by providing a flow path controlling plate to the space in a dielectric window through which microwave for forming plasma is introduced into a reaction vessel and dividing the flow of a refrigerant into a plurality of numbers.
CONSTITUTION: A base body is arranged in a reaction vessel. Microwave discharge plasma of a gaseous raw material is formed by microwave electric power introduced via a microwave introduction part. Thereby the built-up film of the reactive substance in plasma is formed on the surface of the base body. In a forming device for the built-up film due to a microwave plasma CVD method, the microwave introduction part is constituted of both a waveguide 203 and a first and second windows 213, 214 of a microwave permeable dielectric fitted thereto by an airtight sealing part 215. Furthermore a microwave permeable flow path controlling plate 217 is arranged to the space 218 in the interval thereof. Thereby cooling water passed through a refrigerant introduction path 219 is introduced from an introduction part 220. Its flow is divided into 4-10 pieces and uniform cooling is performed and thereafter reconverged in a discharge port 221 and discharged.
| JPS60142345 | PHOTOCONDUCTIVE MEMBER |
| JPS61295563 | PHOTOCONDUCTIVE MEMBER |
NIINO HIROAKI
OKAMURA TATSUJI
Next Patent: DEVICE FOR FORMING BUILT-UP FILM DUE TO MICROWAVE PLASMA CVD METHOD