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Title:
DEVICE FOR HEATING SUBSTRATE IN VACUUM
Document Type and Number:
Japanese Patent JPS60125371
Kind Code:
A
Abstract:

PURPOSE: To irradiate uniformly IR rays to the surface of a substrate in the stage of removing the gas adsorbed on the surface of the substrate by IR irradiation prior to formation of a thin film on the substrate surface in a vacuum chamber by adjusting the relative position of an IR heater, reflecting shade and substrate.

CONSTITUTION: A reflecting shade 9 having the circular section in the reflecting part is attached in the upper part of an annular IR heater 8 in the stage of irradiating and heating the surface of the substrate 5 in a vacuum vessel 34 by the heater 8 and removing the gaseous impurity adsorbed on the surface. The shape of the reflecting face of the shade 9 and the position of the substrate 5 are so adjusted that the total quantity of the IR reflected light (b) from the shade 9 and the direct light (a) to be irradiated to the central part 14 of the substrate 5 far from the direct light (a) from the heater 8 is made uniform with the quantity of the IR rays to be irradiated in the part near the heater 8 in the stage of irradiating and heating the surface of the substrate 5 in the lower part by the heater 8 and removing the adsorbed gas. The surface of the substrate 5 is uniformly irradiated with IR rays by which the gaseous impurity is uniformly irradiated by the IR rays and is thus uniformly removed.


Inventors:
TATEISHI HIDEKI
SHIMIZU TAMOTSU
IWASHITA KATSUHIRO
AIUCHI SUSUMU
NAKAMURA HIROSHI
Application Number:
JP23131883A
Publication Date:
July 04, 1985
Filing Date:
December 09, 1983
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
C23C14/50; C23C14/54; C23C16/48; H01L21/203; H01L21/26; H01L21/31; H01L21/324; (IPC1-7): C23C14/50; H01L21/203; H01L21/31
Attorney, Agent or Firm:
Akio Takahashi



 
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