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Title:
DEVICE FOR INSPECTING SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPS648640
Kind Code:
A
Abstract:

PURPOSE: To prevent fluorocarbon from invading sections of an inspection device by providing an upper chamber having an inspection probe and its positioning unit and a lower chamber for disposing an LSI chip, forming an exhaust port at the upper position of the lower chamber, blowing inert gas to the upper chamber, feeding it out through a clearance to the lower chamber, and further discharging it together with refrigerant gas from the exhaust port.

CONSTITUTION: When chips 1, 1' dipped in fluorocarbon liquid 14 are energized through a power line 8, the chips 1, 1' are heated, the liquid 14 is boiled, and evaporated to remove the heats of the chips 1, 1'. Thus, fluorocarbon vapor generated in this manner is filled in a room 17. On the other hand, dry inert gas blown to a room 16 is blown from the room 16 through a clearance 15 into the room 17. Thus, since the flow of the fluorocarbon vapor to be leaked to the upper room 16 from the room 17 counterflows at the clearance 15 to the flow 20 of the inert gas, the flow of the fluorocarbon vapor is stopped. The mixture gas of the fluorocarbon and the inert gas stored in the lower room is forcibly exhausted out of the room 17 from an exhaust port 13a as the mixture gas 13.


Inventors:
NAKAJIMA TADAKATSU
OGURO TAKAHIRO
KUWABARA HEIKICHI
SASAKI SHIGEYUKI
TAKENAKA TAKATSUGU
Application Number:
JP16233287A
Publication Date:
January 12, 1989
Filing Date:
July 01, 1987
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
H01L21/66; G01R31/26; (IPC1-7): G01R31/26; H01L21/66
Attorney, Agent or Firm:
Katsuo Ogawa