Title:
DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2020201505
Kind Code:
A
Abstract:
To operate a processing unit for use in each of multiple processing steps efficiently, while improving productivity of the entire manufacturing line relevant to substrate processing.SOLUTION: A device manufacturing method includes a coating step of coating a sheet substrate with a photosensitive functional layer, while transporting at a first velocity in a first processing unit, a first recovery step of winding the sheet substrate, exported from the first processing unit, around a first recovery roller and cutting, a first patterning step of patterning the photosensitive functional layer while transporting the sheet substrate into a second processing unit where the sheet substrate is not processed, out of second processing units performing second processing while transporting the sheet substrate at a second velocity slower than the first velocity, a second recovery step of winding the sheet substrate around a second recovery roller and cutting, and a second patterning step of patterning the photosensitive functional layer while transporting the sheet substrate wound around the second recovery roller. The second patterning step is set to be started before the first patterning step is completed.SELECTED DRAWING: Figure 1
Inventors:
KITO YOSHIAKI
SUZUKI TOMOYA
HORI MASAKAZU
SUZUKI TOMOYA
HORI MASAKAZU
Application Number:
JP2020139661A
Publication Date:
December 17, 2020
Filing Date:
August 20, 2020
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; B65H20/00; G03F9/00; H01L21/677
Domestic Patent References:
| JP6753501B2 | 2020-09-09 | |||
| JP2010282203A | 2010-12-16 | |||
| JP2004186469A | 2004-07-02 | |||
| JPH08152718A | 1996-06-11 | |||
| JP2004103947A | 2004-04-02 |
Attorney, Agent or Firm:
Nishizawa Kazumi
Kazunori Onami
Junichi Kobayashi
Kazunori Onami
Junichi Kobayashi