Title:
デバイス製造方法
Document Type and Number:
Japanese Patent JP6481784
Kind Code:
B2
Abstract:
A transfer device is provided with: a plate holding part for holding a transfer plate having a porous plate formed from a porous material with a predetermined thickness and a transfer pattern layer formed on one surface side of the porous plate; an object holding part for holding an object to which the pattern layer of the transfer plate can be transferred in close contact with or in proximity to one surface of the transfer plate; and a fluid supply part for supplying a fluid with a predetermined pressure from the other surface side to the one surface side of the porous plate.
More Like This:
| JP2022047853 | SEMICONDUCTOR MEMORY DEVICE |
| JP2022147716 | SEMICONDUCTOR STORAGE DEVICE |
| JP2013065636 | NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD OF THE SAME |
Inventors:
Tomoya Suzuki
Application Number:
JP2018017123A
Publication Date:
March 13, 2019
Filing Date:
February 02, 2018
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/336; B41F17/14; B41M1/30; B41M1/34; B41M3/12; H01L29/786; H01L51/50; H05B33/10
Domestic Patent References:
| JP2003229435A | ||||
| JP4178633A | ||||
| JP2012119531A |
Attorney, Agent or Firm:
Nishizawa Kazumi
Kazunori Onami
Junichi Kobayashi
Kazunori Onami
Junichi Kobayashi