Title:
デバイス製造方法およびリソグラフィ装置、ならびに、コンピュータプログラム
Document Type and Number:
Japanese Patent JP4860679
Kind Code:
B2
Abstract:
In a lithographic printing process a substrate is moved, in the scanning direction, relative to a patterned beam of radiation being projected onto it during a scanning exposure of a pattern feature. An image of the pattern feature is blurred in the scanning direction. The effect of the blurring is used to reduce a difference of critical dimension between similar horizontal and vertical features. The effect on critical dimension may be obtained by providing an amount of anamorphic magnification to the projection system.
More Like This:
| JPH07335540 | POSITIONING DEVICE |
| JP2009065173 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| WO/1995/010798 | TOP ANTI-REFLECTIVE COATING FILMS |
Inventors:
Van Damme, Marinus, Johannes, Maria
Application Number:
JP2008282657A
Publication Date:
January 25, 2012
Filing Date:
November 04, 2008
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP6310399A | ||||
| JP2000214382A | ||||
| JP2003534652A | ||||
| JP7183190A | ||||
| JP8293463A | ||||
| JP2002359184A | ||||
| JP11003856A | ||||
| JP8222495A | ||||
| JP7183214A | ||||
| JP2005292450A | ||||
| JP8083744A |
Foreign References:
| WO2004112107A1 | ||||
| US5710619 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki