Title:
DEVICE AND METHOD FOR ADJUSTING POSITION OF ROTARY PLATE
Document Type and Number:
Japanese Patent JP2011177874
Kind Code:
A
Abstract:
To provide a device and a method for adjusting a position of a rotary plate responsive to micro displacement of the rotary plate, wherein its structure is simple.
The device 50 for adjusting the position of the rotary plate includes an absorption conveying device 51, a recognition camera 7, and a control device 10. The absorption conveying device is provided with an absorption head 1 to absorb the rotary plate 2, wherein the absorption head 1 includes a head body 101, a metal absorption pad 102 absorbing the rotary plate, and a bonding part 103 joining the head body and the absorption pad and deformed so that the absorption pad can follow an attitude of the rotary plate.
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Inventors:
OE SHINICHI
SUGIURA SEI
SATONE TOSHIKAZU
HASEGAWA RITSUKO
SUGIURA SEI
SATONE TOSHIKAZU
HASEGAWA RITSUKO
Application Number:
JP2010047326A
Publication Date:
September 15, 2011
Filing Date:
March 04, 2010
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
B25J15/06; B25J13/08; B65G49/06
Domestic Patent References:
JPH11284015A | 1999-10-15 | |||
JPH08290382A | 1996-11-05 | |||
JPH07186080A | 1995-07-25 | |||
JPH0482685A | 1992-03-16 | |||
JP2002307345A | 2002-10-23 | |||
JP2006049485A | 2006-02-16 |
Attorney, Agent or Firm:
Takuji Yamada
Mitsuo Tanaka
Mikio Takeuchi
Mitsuo Tanaka
Mikio Takeuchi