To provide a device for applying a coating liquid to a cylindrical substrate, by which a coating film excellent in uniformity and free of unevenness in thickness and a seam can be formed with high production efficiency.
In the applying device 1, a coating liquid 3 is supplied from a coating liquid supply roll 5 to an applying roll 4, contact-transferred from the applying roll 4 to a cylindrical substrate 2 and applied to the cylindrical substrate 2. A loss tangent tanδ of the coating liquid 3 used for the application at a frequency of 6.28 rad/s is 1-10. The coating liquid supply roll 5 has a fine recess part 8 in at least part of the peripheral length and has recess depth decreasing parts 9a, 9b formed in such a way that the depth of each fine recess 8a decreases near both ends of the fine recess part 8 in the peripheral direction. In the fine recess part 8, the sum L (=L1+L2) of the peripheral length L1 of a part where fine recesses 8a are formed in nearly equal depth and the peripheral length L2 of one recess depth decreasing part 9a is made integral multiples (≥1 time) of the peripheral length Lc of the cylindrical substrate 2.
OBATA TAKATSUGU
WADOKORO JUNICHI
Takeshi Sugiyama
Minetarou Hirose
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