DEVICE AND METHOD FOR CLEANING SUBSTRATE

Japanese Patent JP3426560

B2

PROBLEM TO BE SOLVED: To provide a device and a method for cleaning a substrate, by which the substrate such as a semiconductor material, ULSI and a wafer can be cleaned with high cleaning effectiveness.
SOLUTION: This substrate cleaning device has a substrate cleaning section 5 for cleaning the substrate being a subject to be cleaned by the action of a cleaning liquid on the substrate surface by jetting the cleaning liquid from a supersonic nozzle for generating a supersonic current while accelerating the speed of the cleaning liquid into supersonic one by a compressed gas and an ultraviolet irradiation section 7 for irradiating the substrate, just before or/and just after it is cleaned with the cleaning liquid, with ultraviolet rays in the atmosphere.

JP5943519	Substrate case cleaning equipment
JP3074905	[Name of device] Photovoltaic power generation equipment module Light receiving plate Cleaning robot for cleaning glass
JPH06126254	VIBRATING MOBILE CENTRIFUGAL WASHER

Naoya Hirano
Eiichi Hoshino
Hiroma Hoko
Taro Ogawa

JP2000109852A

July 14, 2003

April 11, 2000

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島田理化工業株式会社
富士通株式会社
株式会社日立製作所

B08B3/02; B08B3/10; G03F1/82; H01L21/304; (IPC1-7): B08B3/10; B08B3/02; G03F1/08; H01L21/304

JP200031239A
JP8318181A
JP200070885A

Makoto Hagiwara

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