Title:
DEVICE AND METHOD FOR GENERATING PROCESSING LIQUID, AND APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
Document Type and Number:
Japanese Patent JP2013136024
Kind Code:
A
Abstract:
To provide a device and method for generating a processing liquid, and an apparatus and method for processing a substrate, capable of improving a processing performance while preventing static charge.
A substrate processing apparatus 1 includes: a melting unit 3A for dissolving a carbon dioxide gas to liquid; a bubble generating unit 5A for generating a plurality of microbubbles in the liquid by a bubble generating gas while maintaining a dissolution amount of the carbon dioxide gas to the liquid; and a processing unit 6 for processing a substrate using the liquid containing a plurality of microbubbles obtained by dissolving the carbon dioxide gas.
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Inventors:
HIROSE HARUMICHI
KONASE ATSUSHI
KOYAMA HIROTAKA
MIYAZAKI KUNIHIRO
MIYAMOTO TAKASHI
TOITA SHO
KIDOKORO HIROSHI
KONASE ATSUSHI
KOYAMA HIROTAKA
MIYAZAKI KUNIHIRO
MIYAMOTO TAKASHI
TOITA SHO
KIDOKORO HIROSHI
Application Number:
JP2011288361A
Publication Date:
July 11, 2013
Filing Date:
December 28, 2011
Export Citation:
Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
B01F1/00; B01F3/04; B01F5/06; H01L21/304
Domestic Patent References:
| JP2002172318A | 2002-06-18 | |||
| JP2005093873A | 2005-04-07 | |||
| JPS62294475A | 1987-12-21 | |||
| JP2004344821A | 2004-12-09 |
Foreign References:
| WO2008050832A1 | 2008-05-02 |
Attorney, Agent or Firm:
Shinichi Ogawa
Fumihiko Nakahara
Fumihiko Nakahara