To provide a device and a method for hologram exposure for manufacturing a reflection type hologram element, the device and method being characterized in that the hologram element is easily manufactured and diffraction efficiency to light beams in different wavelengths is made constant.

When the hologram element is manufactured by exposing a substrate which has a hologram sensing agent to a plurality of laser light sources in order, the laser light sources are separated into two optical paths and luminous flux is widened, two luminous fluxes are made to cross each other at a specified angle, and the substrate is held in the position where the luminous fluxes are made to cross each other so as to move in parallel at right angles to the optical axis of one luminous flux.