Title:
脱イオン水を炭酸化する装置、システム及び方法
Document Type and Number:
Japanese Patent JP4920751
Kind Code:
B2
Abstract:
Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided.
Inventors:
Seivert, Johannes
Bramel, Ulrich
Got's Chalk, Christiane
Low, joachim
Bramel, Ulrich
Got's Chalk, Christiane
Low, joachim
Application Number:
JP2009533502A
Publication Date:
April 18, 2012
Filing Date:
October 17, 2007
Export Citation:
Assignee:
MKS INSTRUMENTS,INCORPORATED
International Classes:
B01F1/00; B01F15/04; C02F1/68; H01L21/304
Domestic Patent References:
| JP2005331513A | 2005-12-02 | |||
| JP2003334433A | 2003-11-25 | |||
| JP2003154242A | 2003-05-27 | |||
| JPH0426021A | 1992-01-29 | |||
| JPH0767554B2 | 1995-07-26 | |||
| JP2004025078A | 2004-01-29 | |||
| JP2004344821A | 2004-12-09 | |||
| JPH10324502A | 1998-12-08 | |||
| JPH10202242A | 1998-08-04 | |||
| JPS59173184A | 1984-10-01 |
Attorney, Agent or Firm:
Shinjiro Ono
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Fujihiro Kanda
Kazuo Shamoto
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Fujihiro Kanda