Title:
DIAMINO COMPOUND AND MANUFACTURE METHOD THEREOF
Document Type and Number:
Japanese Patent JP3636204
Kind Code:
B
Abstract:
PROBLEM TO BE SOLVED: To provide a diamino compound and manufacture method thereof, suitable for obtaining a polyimide resin that is a material for a liquid crystal alignment film having no afterimage and high retention rate of voltage at low to high temperatures.
SOLUTION: The diamino compound is represented by general formula (1) (wherein n is 0 or 1).
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Inventors:
Sawai, Toshiya
Oikawa, Seiji
Yazawa, Masaaki
Murata, Shizuo
Hayakawa, Masaharu
Nakagawa, Etsuo
Sawada, Shinichi
Oikawa, Seiji
Yazawa, Masaaki
Murata, Shizuo
Hayakawa, Masaharu
Nakagawa, Etsuo
Sawada, Shinichi
Application Number:
JP2004000297381
Publication Date:
January 14, 2005
Filing Date:
October 12, 2004
Export Citation:
Assignee:
CHISSO CORP
International Classes:
C07C211/50; C07B61/00; C07C209/34; C07C209/36; C07C211/00; C07B61/00; C07C209/00; (IPC1-7): C07C211/50; C07C209/36
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