PURPOSE: To provide a reliable dielectric device by forming at least one electrode composed mainly of an alloy containing white metals such as platinum, palladium, iridium, rhodium, osmium and ruthenium so as to prevent the degradation of retention and fatigue of electrodes.

CONSTITUTION: A platinum-palladium alloy film is formed on a first insulating film 102 of a substrate. To form a lower electrode 101, the alloy film is etched through a photoresist mask, and the photoresist is removed. A dielectric film 103 is formed by etching a high-permittivity film of SrTiO3 through a similar process. To form an upper electrode 104, another platinum-palladium alloy film is formed and etched through a similar process. According to this method, it is possible to prevent the oxidation of electrodes during heat treatments or with a lapse of time.