Title:
【発明の名称】回折効率が空間的に可変なフェーズマスク
Document Type and Number:
Japanese Patent JP2001511906
Kind Code:
A
Abstract:
A phase mask (15) for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a refractive index profile in a photosensitive optical medium, the phase mask (15) comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19). The grating corrugations (19) have a non-uniform relief depth across the outer surface for photoinducing a non-uniform refractive index profile in the photosensitive optical medium. The non-uniform relief depth is defined by a variable thin film layer (21) of variable thickness overlaying the substrate (17). The grating corrugations (19) can either be etched into the variable thin film layer (21) itself or be etched into the substrate (17), with the variable this film layer (21) being deposited on it after etching. Methods to make such phase masks are also provided.
Inventors:
Abetz Peter
Polier michel
Shuji Phone
Capola Nadia
Polier michel
Shuji Phone
Capola Nadia
Application Number:
JP53519098A
Publication Date:
August 14, 2001
Filing Date:
February 11, 1998
Export Citation:
Assignee:
Anstiunion optics
Radilis Ink
Radilis Ink
International Classes:
G03F1/00; G02B5/18; G02B27/58; G03F7/20; (IPC1-7): G02B5/18; G03F1/08; G03F7/20
Attorney, Agent or Firm:
Yoshio Kosugi (1 person outside)