Title:
電子顕微鏡装置システム及び電子顕微鏡装置システムを用いた寸法計測方法
Document Type and Number:
Japanese Patent JP4500099
Kind Code:
B2
Abstract:
The present invention relates to an electron microscope which reduces a difference in measured values that occur due to a difference in resolution that cannot be fully adjusted which exists among electron microscopes, or occurs as time elapses, and a method for measuring dimensions. An operator adapted to compensate for changes of an electron image to be generated due to a difference in probe diameter is obtained in advance from electron images of one reference sample created by electron microscopes having different resolution (probe diameter). Then a compensation-measurement electron image which is equivalent to an electron image created under the same probe diameter by applying the operator for compensation, and the compensation-measurement electron image is used for measuring the dimensions.
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Inventors:
Chie Shishido
Ryo Nakagaki
Large Saki Mayuka
Hiroki Kawada
Ryo Nakagaki
Large Saki Mayuka
Hiroki Kawada
Application Number:
JP2004137025A
Publication Date:
July 14, 2010
Filing Date:
May 06, 2004
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
G01B15/00; H01J37/22; G01N23/00; G01N23/225; G21K7/00; H01J37/28; H01J40/14; H01L21/66
Domestic Patent References:
| JP11224640A | ||||
| JP9306400A | ||||
| JP11040096A | ||||
| JP2003121132A | ||||
| JP2003100828A | ||||
| JP2003142021A | ||||
| JP2001202911A | ||||
| JP2002117799A | ||||
| JP2000171230A |
Attorney, Agent or Firm:
Polaire Patent Business Corporation
Katsuo Ogawa
Kyosuke Tanaka
Katsuo Ogawa
Kyosuke Tanaka