DISCHARGE INSPECTION DEVICE, SUBSTRATE PROCESSING APPARATUS AND DISCHARGE INSPECTION METHOD

Japanese Patent JP2017034017

A

PROBLEM TO BE SOLVED: To accurately discriminate a propriety of a discharge operation.SOLUTION: In a discharge inspection part 5 of a substrate processing apparatus, a light emission part 51 emits light along a predetermined light presence surface, such that a plurality of flying substances that are liquids discharged from a plurality of discharge ports are irradiated with the light when the plurality of flying substances pass the light presence surface. An imaging part 52 images the plurality of flying substances passing the light presence surface, such that an inspection image including a plurality of bright points which appear on the plurality of flying substances is acquired. A function storage part stores a plurality of point spread functions corresponding to a plurality of divided regions that are set in the inspection image. An image correction part corrects one or more bright points included in each of the divided regions in the inspection image while using the point spread function corresponding to each of the divided regions, such that a corrected inspection image is acquired. A discrimination part uses the corrected inspection image to discriminate the propriety of discharge operations of liquids from the plurality of discharge ports. Thus, the propriety of the discharge operations in the plurality of discharge ports can be accurately discriminated.SELECTED DRAWING: Figure 5

HIKITA YUICHIRO
SAKUYAMA TSUTOMU
KAMIYAMA KENJI
SANO HIROSHI

JP2015150485A

February 09, 2017

July 30, 2015

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SCREEN HOLDINGS CO LTD

H01L21/304; G06T5/00

Masahiro Matsusaka
Tsutomu Tanaka
Masamichi Ida

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