Title:
DISCHARGE PLASMA TREATMENT METHOD
Document Type and Number:
Japanese Patent JP2003168597
Kind Code:
A
Abstract:
To provide a discharge plasma treatment method which can stably and evenly treat the surface of a carrying substance to be treated.
For the discharge plasma treatment, in which an electric field is applied between a pair of parallel flat type electrodes, at least one of which is covered with a solid dielectric, a treating gas is introduced between the electrodes, and a substance to be treated is treated with glow discharge plasma generated, the treatment is conducted while rotating the substance to be treated and a plasma generating part relatively and in parallel and horizontally moving them.
Inventors:
IWANE KAZUYOSHI
Application Number:
JP2001364593A
Publication Date:
June 13, 2003
Filing Date:
November 29, 2001
Export Citation:
Assignee:
SEKISUI CHEMICAL CO LTD
International Classes:
H05H1/46; B01J19/08; H01L21/302; H01L21/3065; H01L21/31; H05H1/24; (IPC1-7): H05H1/46; B01J19/08; H01L21/3065; H01L21/31; H05H1/24