Title:
フォトレジスト組成物のための溶解速度調整剤
Document Type and Number:
Japanese Patent JP2007525543
Kind Code:
A
Abstract:
Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.
Inventors:
Rose, Larry F
Rally
Goodall, Brian El
Macintosh, Lester H, The Third
Duff, Robert Jay
Rally
Goodall, Brian El
Macintosh, Lester H, The Third
Duff, Robert Jay
Application Number:
JP2006501179A
Publication Date:
September 06, 2007
Filing Date:
February 20, 2004
Export Citation:
Assignee:
Promelas, LLC
International Classes:
C08F232/08; G03C1/76; G03F7/004; G03F7/038; G03F7/039; G03F7/085; H05K3/14; H05K3/18; G03F
Domestic Patent References:
| JP2004182796A | 2004-07-02 | |||
| JP2004514952A | 2004-05-20 |
Foreign References:
| WO2002031595A2 | 2002-04-18 |
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi