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Title:
DONOR SUBSTRATE, MICRO-STRUCTURE AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2007000958
Kind Code:
A
Abstract:

To provide a donor substrate, in which thin film patterns partially different in material in a plane are stacked, a micro-structure and a manufacturing method thereof.

This manufacturing method of a micro-structure includes: a first process of transferring a laminated member 107 of the donor substrate 108 to the target substrate 109 side; a second process of removing a disappearing and releasing layer 102 part for controlling the releasing ability from the substrate 100 contained in the laminated member 107 transferred to the target substrate 109 side by etching to leave behind a thin film pattern 106 formed of a material part 104-1 and a material part 104-2; and a third process of repeating the first and second processes to sequentially stack a plurality of laminated members 107 of the donor substrate 108 on the target substrate 109 side, thereby manufacturing the micro-structure.


Inventors:
TABATA KAZUAKI
TAKAHASHI MUTSUYA
YAMAZAKI YOSHIFUMI
YAMADA TAKAYUKI
Application Number:
JP2005182509A
Publication Date:
January 11, 2007
Filing Date:
June 22, 2005
Export Citation:
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Assignee:
FUJI XEROX CO LTD
International Classes:
B81C3/00
Attorney, Agent or Firm:
Tadao Hirata