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Patent Searching and Data


Title:
DRAIN IMPURITIES PROCESSING UNIT
Document Type and Number:
Japanese Patent JPH08199673
Kind Code:
A
Abstract:

PURPOSE: To directly charge impurities charged in a dehydration chamber from a pair of impurities separation devices arranged in a processing tank into the dehydration device without interposing a hopper and the like.

CONSTITUTION: Drain introduced in a processing tank 40 is let flow in either of processing chambers 48, and an impurities separation device 10 arranged in the processing chamber 48 is operated. Drain impurities floating in the drain are separated from the drain and drawn up by means of the impurities separation device 10, and charged in a dehydration chamber 46 provided on the center part of the processing tank 40. The impurities charged in the dehydration chamber 46 is directly charged into a dehydration device arranged in the dehydration chamber 46. Because the impurities separation devices 10 are under the condition in which the upper end parts are opposed to each other at the upper part of the dehydration chamber 46 over the dehydration device 20, the impurities charged in the dehydration chamber 46 from the respective upper end parts can be directly charged to the introducing hopper 21b of the dehydration device 20, without interposing a hopper and the like.


Inventors:
HATASAKI YOSHIYUKI
MUROI KOJI
KUNIHARA TAKASHI
Application Number:
JP1264895A
Publication Date:
August 06, 1996
Filing Date:
January 30, 1995
Export Citation:
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Assignee:
SHIN MEIWA IND CO LTD
International Classes:
E03F5/14; (IPC1-7): E03F5/14
Attorney, Agent or Firm:
Yoshiro Kurauchi