To provide a drawing apparatus, an exposure drawing apparatus, a program, and a drawing method in which even when a circuit pattern is deformed corresponding to distortion of a basal plate, an electronic component can be mounted on the basal plate with high accuracy.
Coordinate data that show a first position on design of two or more base marks disposed on a basal plate to be exposed, a drawing pattern drawn to the basal plate to be exposed determined based on the first position, and respective actual second positions of two or more base marks are obtained (S101, 103), a gap compensation amount for compensating a gap between the first position and the second position for respective two or more base marks is made a value in which a gap compensation amount of the base mark and a compensation amount of a reference mark closest to the base mark are averaged (S113), when drawing a drawing pattern to a basal plate to be exposed depending on coordinate data that show a drawing pattern based on coordinate data that show the second position, coordinate data that show a drawing pattern is compensated based on the averaged gap compensation amount (S115).
| JP2011039264A | 2011-02-24 | |||
| JPH08192337A | 1996-07-30 | |||
| JP2007173855A | 2007-07-05 | |||
| JP2007110172A | 2007-04-26 | |||
| JP2009267099A | 2009-11-12 | |||
| JP2011095742A | 2011-05-12 | |||
| JP2005157326A | 2005-06-16 | |||
| JP2011039264A | 2011-02-24 | |||
| JPH08192337A | 1996-07-30 | |||
| JP2007173855A | 2007-07-05 | |||
| JP2007110172A | 2007-04-26 | |||
| JP2009267099A | 2009-11-12 | |||
| JP2011095742A | 2011-05-12 | |||
| JP2005157326A | 2005-06-16 |
| WO2011018983A1 | 2011-02-17 | |||
| WO2011018983A1 | 2011-02-17 |
Kato Kazunori
Hiroshi Fukuda
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