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Patent Searching and Data


Title:
描画装置
Document Type and Number:
Japanese Patent JP3982502
Kind Code:
B2
Abstract:
A method for forming a pattern on a substrate, including the steps of: ejecting liquid drops from an ejection head having nozzles onto a reference plate on which a plurality of target positions are defined, the target positions being arranged in at least one row; detecting an amount of a displacement between the target positions and the positions at which the liquid drops have actually landed; determining a relative positional error relative to the ejection head for each of the at least one row of the target positions based on the amount of the displacement; determining a correction value for each of the at least one row based on the relative positional error; and sequentially changing a relative position of the substrate and the ejection head based on the corrections values when the liquid drops are being ejected onto the substrate.

Inventors:
Nobuaki Nagae
Application Number:
JP2004007904A
Publication Date:
September 26, 2007
Filing Date:
January 15, 2004
Export Citation:
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Assignee:
Seiko Epson Corporation
International Classes:
B05D3/00; H04R9/02; B05C5/00; B05C11/00; B05D1/26; B05D7/00; B29C65/52; B41J2/01; G06F11/30; H01L21/027; H01L51/50; H04R9/06; H04R31/00; H05B33/10; H05B33/14; H04R1/06
Domestic Patent References:
JP2001044601A
JP9033710A
JP11064626A
JP2001228321A
JP2003001175A
JP2003251243A
JP2003127392A
JP2003283104A
JP2003165209A
JP2003276170A
Attorney, Agent or Firm:
Kazuya Nishi
Masatake Shiga
Masakazu Aoyama