To provide a drawing system that can appropriately correct a drawing position according to deformation of a drawing object such as a substrate, can cope with various manufacture processes and can form a drawing pattern with high accuracy.
In a drawing device using an optical modulation element such as a DMD (digital micromirror device), positions of four alignment holes M0 to M3 are measured by using a CCD. Reference division regions DV0 to DV3 are defined by dividing a preliminarily determined reference rectangle Z0 into 22 segments; deformed division regions DM0 to DM3 are defined by dividing a deformed rectangle Z defined by the measured four alignment holes M0 to M3 into 22 segments; an offset amount, a rotation angle and a scale ratio in each division region are calculated on the basis of the above regions DV0 to DV3 and DM0 to DM3; drawing data belonging to the reference division region is corrected on the basis of the obtained offset amount, rotation angle and scale ratio.
| JP2005221806A | 2005-08-18 | |||
| JP2005300628A | 2005-10-27 |
Hiroki Ogura
Tsuyoshi Nonaka
Shigeru Torayama
Tsubouchi Shin