Title:
DRESSING DEVICE AND POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2022018685
Kind Code:
A
Abstract:
To provide a dressing device which can provide excellent dressing performance for a long time and can excellently maintain polishing performance, thereby enabling improvement productivity of polishing, and a polishing device.SOLUTION: A dressing device comprises: a dresser 30 which is provided in polishing device polishing a workpiece W by bringing a polishing cloth 12 into contact with a substrate-like workpiece W, the dresser 30 having a dressing surface 33 relatively sliding on the polishing surface 13 of the polishing cloth 12 thereby dressing the polishing cloth 12; dresser drive means rotating the dresser 30; a high pressure water generation device 34 supplying high pressure water pressurized to 1 to 15 MPa; and a high-pressure water jet nozzle 37 jetting high-pressure water to the rotating dressing surface 33. Thus, the dressing surface 33 can be effectively cleaned by jetting the high-pressure water to the dressing surface 33 and excellent dressing performance can be maintained for a long time. Therefore, polishing characteristics which are stable for a long time is obtained, and a time for polishing can be shortened.SELECTED DRAWING: Figure 1
Inventors:
MITSUI TAKAHIKO
YAMAMOTO EIICHI
YAMAMOTO EIICHI
Application Number:
JP2020121966A
Publication Date:
January 27, 2022
Filing Date:
July 16, 2020
Export Citation:
Assignee:
OKAMOTO MACHINE TOOL WORKS
International Classes:
B24B53/017; B24B53/007; B24B53/14; B24B55/06; H01L21/304
Attorney, Agent or Firm:
Masahisa Ohtake
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