Title:
ガス置換用ドライルーム
Document Type and Number:
Japanese Patent JP7306683
Kind Code:
B2
Abstract:
The present invention provides a gas replacement system capable of switching between an atmospheric environment or a low dew point and an inert gas environment within a relatively short time in a drying chamber of an inert gas concentration containing a manufacturing device. The gas replacement system needs to keep the inside clean with a low dew point and inert gas concentration. In the gas replacement system, dry air is introduced into the chamber in a one-way manner to discharge moisture to the outside of the device during performing repairing or maintenance and inert gas circulation pipelines are all closed by valves and the like to independently perform circulation operation, thereby significantly shortening a pause time due to atmospheric replacement even when the plurality of chambers exist. By connecting a low dew point gas supply device and an inert gas purification device to form an integrated type, space can be saved and cost can be reduced.
Inventors:
Wataru Tanaka
Hitomi Nishikunihara
Kazuhiko Kawaguchi
Mayu Iwasaki
Hiroaki Ejima
Hitomi Nishikunihara
Kazuhiko Kawaguchi
Mayu Iwasaki
Hiroaki Ejima
Application Number:
JP2019099933A
Publication Date:
July 11, 2023
Filing Date:
May 29, 2019
Export Citation:
Assignee:
Seibu Giken Co., Ltd.
International Classes:
F26B21/04; B01D53/26; F26B9/00; H05B33/10; H10K50/10; H10K59/00
Domestic Patent References:
| JP2011149661A | ||||
| JP2019052835A |