PURPOSE: To simplify a mechanism for handling a substrate by a method wherein an operation axis is turned or advanced and retreated via a magnetic coupling while a cylindrical body is turned or advanced and retreated.

CONSTITUTION: When an operation axis 16a is coupled to a driving part to turn and drive the operation axis 16a, permanent magnets 67, 76 are fixed to an outer circumference face at the outside of a spare vacuum chamber 19; the magnets are covered with a cylindrical partition wall 62 whose one end face is sealed and are sealed airtightly on the side of the spare vacuum chamber 19; the magnets are surrounded nearly coaxially by a cylindrical body 75 which can be turned around this cylindrical partition wall 62 and can be advanced and retreated along the wall. It the cylindrical body 75 is turned or advanced and retreated, the operation axis 16a can be turned or advanced and retreated. By this setup, a substrate can be transferred between a cassette chamber and a reaction chamber only by a turning operation of the operation axis 16a and its advance and retreat operation in the axial direction; a mechanism for handling the substrate is simplified.