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Title:
DRY VACUUM PUMP AND PROCESSING CHAMBER PRESSURE REDUCTION METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2010229832
Kind Code:
A
Abstract:

To provide a dry vacuum pump and a processing chamber pressure reduction method using the same, for maintaining the isolation property between an interlock mechanism and a pump chamber without using nitrogen gas, and reducing an initial cost and a running cost.

The dry vacuum pump includes a shaft seal 7 which has sealants 72 formed on the outer circumferences of driving shafts 4 on the respective sides of the interlock mechanism 5 and the pump chamber 6, high-pressure spaces 73 in which pressures higher than the atmospheric pressure are maintained between the sealants 72, and air introducing paths 74 for introducing high-pressure air to the high-pressure spaces 73. The dry vacuum pump also includes a compressor 8 which supplies air under the pressure higher than the atmospheric pressure into the high-pressure spaces 73 through the air introducing paths 74 in the shaft seal 7.


Inventors:
Narita, Hidemi
Application Number:
JP2009000075536
Publication Date:
October 14, 2010
Filing Date:
March 26, 2009
Export Citation:
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Assignee:
MITSUMI ELECTRIC CO LTD
International Classes:
F04C27/00; F04C23/00; F04C25/02
Attorney, Agent or Firm:
佐川 慎悟
小林 基子
金丸 清隆



 
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