Title:
DRYING METHOD AND DEVICE
Document Type and Number:
Japanese Patent JP2002130942
Kind Code:
A
Abstract:
To provide a method and device of completely drying an object to be dried such as a shipping box and the like used for storing a semiconductor wafer having a complicated structure and transporting it for a short time.
An object to be dried is allowed to rotate during revolution in a method of allowing the object to be dried to revolve and drying it by a centrifugal force.
Inventors:
MATSUO TAKASHI
TOYAMA KOHEI
TOYAMA KOHEI
Application Number:
JP2000331032A
Publication Date:
May 09, 2002
Filing Date:
October 30, 2000
Export Citation:
Assignee:
SHINETSU HANDOTAI KK
International Classes:
F26B5/08; F26B9/00; F26B11/08; H01L21/304; (IPC1-7): F26B5/08; F26B9/00; F26B11/08; H01L21/304
Attorney, Agent or Firm:
Shoji Ishihara
Previous Patent: METHOD AND DEVICE FOR MAINTAINING PURITY BY GAS LIQUEFIER
Next Patent: UMBRELLA DEHYDRATOR
Next Patent: UMBRELLA DEHYDRATOR